CVD Vacuum Chamber

CVD Vacuum Chamber

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CVD Vacuum Chamber

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MOQ : 1 Number

CVD Vacuum Chamber Specification

Method
TIG welded construction, helium leak tested

Coating
Electropolished inner surface

Size
Diameter: 300 mm; Length: 500 mm (customizable)

Load Capacity
Up to 50 kg internal fixtures/sample holders

Thread Type
Metric ISO fine threads on flanges and ports

Hardness
Rockwell B80-B85

Weight
Approx. 35 kg

Shape
Cylindrical chamber with custom flanges

Accuracy
High vacuum integrity, leak rate < 1x10^-7 mbar l/s

Machine Type
CVD Vacuum System Integration

Type
Vacuum Chamber for CVD

Material
Stainless Steel 304/316

CNC
Yes

Tolerance
0.005 mm

Surface
Polished, mirror finish

Use
Chemical Vapor Deposition processes

Application
Thin film deposition, semiconductor manufacturing, material research

Usage & Applications
For laboratory and industrial CVD reactions

Internal Mounts
Fixed sample holders and custom mounting rails

Sealing
Viton O-ring seals, optional metal gasket

Feedthrough Ports
4 standard KF/NW ports for electrical/gas/vacuum connections

Pump Compatibility
Compatible with rotary, diffusion, and turbomolecular pumps

Maximum Vacuum Level
10^-7 mbar

Optional Accessories
Heating jackets, temperature controllers, vacuum gauges

Temperature Rating
Max 350C operating temperature

Compliance
Meets CE and ISO 9001 standards

Pressure Range
Atmospheric to ultra-high vacuum (UHV)

Chamber Volume
Approximately 35 liters (standard model)

Maintenance
Easy disassembly and access for cleaning

Viewport
Quartz glass observation window, 1 pcs

Electrical Connectivity
Optional electrical feedthroughs for sensors & heaters

CVD Vacuum Chamber

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